Market Executive Summary

Extreme ultraviolet lithography is an advanced version of lithography which uses an extreme ultra violet light of the shortest wavelength of 13.5 nm. Lithography is mainly used to print complicated patterns which are mostly highlight integrated circuits onto semiconductor wafers.

Market Analysis and Insights: Global Extreme Ultraviolet (EUV) Lithography Market

The global Extreme Ultraviolet (EUV) Lithography market is projected to grow from US$ 8957.8 million in 2024 to US$ 17350 million by 2030, at a Compound Annual Growth Rate (CAGR) of 11.7% during the forecast period.

The US & Canada market for Extreme Ultraviolet (EUV) Lithography is estimated to increase from $ million in 2024 to reach $ million by 2030, at a CAGR of % during the forecast period of 2025 through 2030.

The China market for Extreme Ultraviolet (EUV) Lithography is estimated to increase from $ million in 2024 to reach $ million by 2030, at a CAGR of % during the forecast period of 2025 through 2030.

The Europe market for Extreme Ultraviolet (EUV) Lithography is estimated to increase from $ million in 2024 to reach $ million by 2030, at a CAGR of % during the forecast period of 2025 through 2030.

The global key companies of Extreme Ultraviolet (EUV) Lithography include Canon Inc, Samsung Electronics, Toppan Photomasks Inc., Ushio, Inc., ASML Holding NV, NTT Advanced Technology Corporation, Nikon Corporation, Intel Corporation and Taiwan Semiconductor Manufacturing Company Limited, etc. In 2023, the global top five players had a share approximately % in terms of revenue.

Extreme Ultraviolet (EUV) Lithography is widely used in various fields, such as Integrated Device Manufacturers (IDM), Foundry and Others,, etc. Integrated Device Manufacturers (IDM) provides greatest supports to the Extreme Ultraviolet (EUV) Lithography industry development. In 2023, global % revenue of Extreme Ultraviolet (EUV) Lithography went into Integrated Device Manufacturers (IDM) filed and the proportion will reach to % in 2030. 

Report Covers:

This report presents an overview of global market for Extreme Ultraviolet (EUV) Lithography market size. Analyses of the global market trends, with historic market revenue data for 2019 - 2023, estimates for 2024, and projections of CAGR through 2030. 

This report researches the key producers of Extreme Ultraviolet (EUV) Lithography, also provides the revenue of main regions and countries.  of the upcoming market potential for Extreme Ultraviolet (EUV) Lithography, and key regions/countries of focus to forecast this market into various segments and sub-segments. Country specific data and market value analysis for the U.S., Canada, Mexico, Brazil, China, Japan, South Korea, Southeast Asia, India, Germany, the U.K., Italy, Middle East, Africa, and Other Countries.

This report focuses on the Extreme Ultraviolet (EUV) Lithography revenue, market share and industry ranking of main companies, data from 2019 to 2024. Identification of the major stakeholders in the global Extreme Ultraviolet (EUV) Lithography market, and analysis of their competitive landscape and market positioning based on recent developments and segmental revenues. This report will help stakeholders to understand the competitive landscape and gain more insights and position their businesses and market strategies in a better way.

This report analyzes the segments data by Type and by Application, revenue, and growth rate, from 2019 to 2030. Evaluation and forecast the market size for Extreme Ultraviolet (EUV) Lithography revenue, projected growth trends, production technology, application and end-user industry.

Descriptive company profiles of the major global players, including Canon Inc, Samsung Electronics, Toppan Photomasks Inc., Ushio, Inc., ASML Holding NV, NTT Advanced Technology Corporation, Nikon Corporation, Intel Corporation and Taiwan Semiconductor Manufacturing Company Limited, etc.

Market Segmentation

Global Extreme Ultraviolet (EUV) Lithography Companies Covered

Canon Inc, Samsung Electronics, Toppan Photomasks Inc., Ushio, Inc., ASML Holding NV, NTT Advanced Technology Corporation, Nikon Corporation, Intel Corporation, Taiwan Semiconductor Manufacturing Company Limited

Global Extreme Ultraviolet (EUV) Lithography Market, by Region

North America (U.S., Canada, Mexico)

Europe (Germany, France, UK, Italy, etc.)

Asia Pacific (China, Japan, South Korea, Southeast Asia, India, etc.)

South America (Brazil, etc.)

Middle East and Africa (Turkey, GCC Countries, Africa, etc.)

Global Extreme Ultraviolet (EUV) Lithography Market, Segment by Type

Mask

Mirrors

Light Source

Others

Global Extreme Ultraviolet (EUV) Lithography Market, Segment by Application

Integrated Device Manufacturers (IDM)

Foundry

Others

Chapter Outline

Chapter 1: Introduces the report scope of the report, executive summary of different market segments (product type, application, etc), including the market size of each market segment, future development potential, and so on. It offers a high-level view of the current state of the market and its likely evolution in the short to mid-term, and long term.

Chapter 2: Revenue of Extreme Ultraviolet (EUV) Lithography in global and regional level. It provides a quantitative analysis of the market size and development potential of each region and its main countries and introduces the market development, future development prospects, market space, and capacity of each country in the world. This section also introduces the market dynamics, latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by companies in the industry, and the analysis of relevant policies in the industry.

Chapter 3: Detailed analysis of Extreme Ultraviolet (EUV) Lithography companies’ competitive landscape, revenue, market share and industry ranking, latest development plan, merger, and acquisition information, etc.

Chapter 4: Provides the analysis of various market segments by Type, covering the revenue, and development potential of each market segment, to help readers find the blue ocean market in different market segments.

Chapter 5: Provides the analysis of various market segments by Application, covering the revenue, and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.

Chapter 6: North America (US & Canada) by Type, by Application and by country, revenue for each segment.

Chapter 7: Europe by Type, by Application and by country, revenue for each segment.

Chapter 8: China by Type, and by Application, revenue for each segment.

Chapter 9: Asia (excluding China) by Type, by Application and by region, revenue for each segment.

Chapter 10: Middle East, Africa, and Latin America by Type, by Application and by country, revenue for each segment.

Chapter 11: Provides profiles of key companies, introducing the basic situation of the main companies in the market in detail, including product descriptions and specifications, Extreme Ultraviolet (EUV) Lithography revenue, gross margin, and recent development, etc.

Chapter 12: Analyst's Viewpoints/Conclusions